Both ICP-MS and ICP-OES have become essential tools in meeting the new requirements for the USP 233 General Chapters on elemental impurity analysis. Before initial use, it should be verified that the procedure outlined in the new chapter is appropriate for the instrument and sample used (procedural verification) by meeting the 'Alternative Procedure Validation' requirements as laid out in the chapter. We have extensive experience of developing and/or validating material specific methods to meet the new requirements.
Inductively Coupled Plasma - Mass Spectroscopy (ICP-MS)
The technique allows for the analysis of over 70 elements (metalic and non-metallic) from low ppt to high ppm in solution. The instrument uses an unique collision cell that removes polyatomic inferences allowing the analysis of complex matrices. Our high matrix introduction (HMI) kit allows the direct analysis of samples which contain high levels of dissolved solids.
Inductively Coupled Plasma - Optical Emission Spectroscopy (ICP-OES)
This technique allows the qualitative and quantitative determination of metals and certain non-metallic elements from low ppb to high ppm allowing for the simultaneous determination of both high and low level elements. The majority of the analysis is performed on aqueous based solutions but there is also the capability to perform the analysis on solvent extracts.
Atomic Absorption Spectroscopy (AAS)
Quantitative determination of metals, largely as minor or trace constituents. The instrumentation available allows analysis by flame absorption, flame emission and graphite furnace.
For more information on what the changes mean to you and how Butterworth Laboratories can help, please contact us.